電漿處理應用在超大型積體電路上高介電常數閘極絕緣層之研究

標題:	電漿處理應用在超大型積體電路上高介電常數閘極絕緣層之研究 The Study of Plasma Treatment on High-k Gate Dielectrics for ULSI Applications
作者:	雷添福 LEI TAN-FU 國立交通大學電子工程研究所
公開日期:	2003
官方說明文件#:	NSC92-2215-E009-060
URI:	http://hdl.handle.net/11536/92172 https://www.grb.gov.tw/search/planDetail?id=873539&docId=167356
Appears in Collections:	Research Plans

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