Title: 具有低介電常數阻障介電薄膜製程整合之研究(I)
Study on the Integration of Barrier Dielectric with Low Dielectric Constant (I)
Authors: 施敏
SZE SIMON MIN
交通大學電子工程系
Issue Date: 2002
Gov't Doc #: NSC91-2215-E009-041
URI: http://hdl.handle.net/11536/92656
https://www.grb.gov.tw/search/planDetail?id=784393&docId=150767
Appears in Collections:Research Plans


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