完整後設資料紀錄
DC 欄位語言
dc.contributor.authorTseng, Shin-Huaen_US
dc.contributor.authorJangJian, Peng-Chungen_US
dc.contributor.authorTsai, Chuan-Meien_US
dc.contributor.authorCheng, Tsai-Muen_US
dc.contributor.authorChu, Hsueh-Liangen_US
dc.contributor.authorChang, Yu-Chuanen_US
dc.contributor.authorChung, Wei-Hsienen_US
dc.contributor.authorChang, Chia-Chingen_US
dc.date.accessioned2014-12-08T15:12:07Z-
dc.date.available2014-12-08T15:12:07Z-
dc.date.issued2011-02-16en_US
dc.identifier.issn0006-3495en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.bpj.2011.01.005en_US
dc.identifier.urihttp://hdl.handle.net/11536/9291-
dc.description.abstractThe mechanism underlying DNA charge transport is intriguing. However, poor conductivity of DNA makes it difficult to detect DNA charge transport. Metallic DNA (M-DNA) has better conducting properties than native DNA. Ni(2+) may chelate in DNA and thus enhance DNA conductivity. On the basis of this finding, it is possible to reveal the mechanisms underlying DNA charge transport. The conductivity of various Ni-DNA species such as single-stranded, full complement, or mismatched sequence molecules was systematically tested with ultraviolet absorption and electrical or chemical methods. The results showed that the conductivity of single-stranded Ni-DNA (Ni-ssDNA) was similar to that of a native DNA duplex. Moreover, the resistance of Ni-DNA with a single basepair mismatch was significantly higher than that of fully complementary Ni-DNA duplexes. The resistance also increased exponentially as the number of mismatched basepairs increased linearly after the tunneling current behavior predicted by the Simmons model. In conclusion, the charges in Ni(2+)-doped DNA are transported through the Ni(2+)-mediated pi-pi stacking corridor. Furthermore, Ni-DNA acts as a conducting wire and exhibits a tunneling barrier when basepair mismatches occur. This property may be useful in detecting single basepair mismatches.en_US
dc.language.isoen_USen_US
dc.titleNi(2+)-Enhanced Charge Transport via pi-pi Stacking Corridor in Metallic DNAen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.bpj.2011.01.005en_US
dc.identifier.journalBIOPHYSICAL JOURNALen_US
dc.citation.volume100en_US
dc.citation.issue4en_US
dc.citation.spage1042en_US
dc.citation.epage1048en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department生物科技學系zh_TW
dc.contributor.department分子醫學與生物工程研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Biological Science and Technologyen_US
dc.contributor.departmentInstitute of Molecular Medicine and Bioengineeringen_US
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