| Title: | 矽化鎳在超大型積體電路之應用研究 Material Properties and Process Technology of Ni-silicide Relevant to ULSI Applications |
| Authors: | 陳茂傑 國立交通大學電子工程學系 |
| Issue Date: | 2000 |
| Gov't Doc #: | NSC89-2215-E009-102 |
| URI: | http://hdl.handle.net/11536/93864 https://www.grb.gov.tw/search/planDetail?id=583882&docId=109705 |
| Appears in Collections: | Research Plans |
- 矽化鎳在超大型積體電路之應用研究(II) / 陳茂傑
- Ti/NiSi/Si及TiN/NiSi/Si堆疊結構 / 陳朝欽;Chen Chao-Chin;雷添福;Lei Tan-Fu
- 矽化鉑在積體電路應用上之材料性質與製程技術 / 崔秉銊;陳茂傑
- Effects of capping layers on the electrical characteristics of nickel silicided junctions / Wu, Chi-Chang;Wu, Wen-Fa;Su, P. Y.;Chen, L. J.;Ko, Fu-Hsiang
- Study of nickel silicide contact on Si/Si1-xGex / Yang, TH;Luo, GL;Chang, EY;Yang, TY;Tseng, HC
- 矽化鎳之製備及NiSi/p+n接面二極體的之研究 / 游正達;Gen-Da You;陳茂傑;Mao-Chieh Chen
- CF4電漿前置處理在超大型積體電路上的相關應用 / 曾泓棋;Tzeng Hung Chi;李崇仁;Lee Chung Len
- 利用離子佈植/電漿植入於矽化鎳 N+/P 接面與複晶矽鍺閘極之研究 / 李美錡;Mei-Chi Lee;雷添福;Tan-Fu Lei
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