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dc.contributor.authorHsieh, Mei-Lien_US
dc.contributor.authorLan, Yi-Shengen_US
dc.date.accessioned2014-12-08T15:12:14Z-
dc.date.available2014-12-08T15:12:14Z-
dc.date.issued2008-05-01en_US
dc.identifier.issn1071-1023en_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.2905240en_US
dc.identifier.urihttp://hdl.handle.net/11536/9402-
dc.description.abstractIn this study, the micropore shape of two-dimensional (2D) photonic crystal structures can be modified and controlled by the intensity ratio of the incident beams of the holographic lithography. By adjusting the intensity ratio of the incident beams, the micropore shape of 2D hexagonal photonic crystal structure could be adjusted from being circular to being elliptical. Hence, we defined and analyzed the ellipticity of the micropore shape on a 2D photonic crystal structure as a function of the intensity ratio of the incident beams. In addition, we set up an optical holographic system by using three incident beams with different intensities to demonstrate the influence of the intensity ratio of the incident beams on the micropore shape. The optical experimental results show that the ellipticity of the micropore shape decreased with increasing the intensity ratio of the incident beams, which is the same trend as with the theoretical analysis. (C) 2008 American Vacuum Society.en_US
dc.language.isoen_USen_US
dc.titleControllable fabrication of the micropore shape of two-dimensional photonic crystals using holographic lithographyen_US
dc.typeArticleen_US
dc.identifier.doi10.1116/1.2905240en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.citation.volume26en_US
dc.citation.issue3en_US
dc.citation.spage914en_US
dc.citation.epage917en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000256304600004-
dc.citation.woscount7-
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