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dc.contributor.authorTseng, Chi-Cheen_US
dc.contributor.authorChou, Shu-Tingen_US
dc.contributor.authorChen, Yi-Haoen_US
dc.contributor.authorChung, Tung-Hsunen_US
dc.contributor.authorLin, Shih-Yenen_US
dc.contributor.authorWu, Meng-Chyien_US
dc.date.accessioned2014-12-08T15:12:14Z-
dc.date.available2014-12-08T15:12:14Z-
dc.date.issued2008-05-01en_US
dc.identifier.issn1071-1023en_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.2912083en_US
dc.identifier.urihttp://hdl.handle.net/11536/9403-
dc.description.abstractIn this article, we report the growth of InAs/GaAs quantum dots (QDs) grown under different As(4)-supply procedures. The growth of the investigated samples carried out by the three procedures of As shutter always opened, As shutter initially opened, and As shutter initially closed. The samples grown by the former two approaches show a uniform QD distribution and the multiple-peak luminescence, which correspond to ground-state, first-excited-state, and second-excited-state luminescence, while that grown by the latter only shows large InAs islands. The results suggest that the As-stabilized condition at the initial stage of QD growth is very critical for the high-quality QD formation. (C) 2008 American Vacuum Society.en_US
dc.language.isoen_USen_US
dc.titleInfluence of As-stabilized surface on the formation of InAs/GaAs quantum dotsen_US
dc.typeArticleen_US
dc.identifier.doi10.1116/1.2912083en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.citation.volume26en_US
dc.citation.issue3en_US
dc.citation.spage956en_US
dc.citation.epage958en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000256304600011-
dc.citation.woscount0-
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