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dc.contributor.author張鼎張en_US
dc.contributor.authorTING-CHANGCHANGen_US
dc.date.accessioned2014-12-13T10:36:40Z-
dc.date.available2014-12-13T10:36:40Z-
dc.date.issued1999en_US
dc.identifier.govdocNSC88-2215-E317-009zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/94093-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=428670&docId=76707en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject高真空zh_TW
dc.subject化學氣相沈積法zh_TW
dc.subject多晶矽zh_TW
dc.subject薄膜電晶體zh_TW
dc.subjectHigh Vacuumen_US
dc.subjectChemical vapor deposition (CVD)en_US
dc.subjectPolycrystalline siliconen_US
dc.subjectThin film transistor (TFT)en_US
dc.title超高真空化學氣相沈積低溫新穎複晶矽薄膜電晶體的製作與可靠度之研究---子計畫I:化學氣相沈積系統成長低溫複晶矽薄膜電晶體及其在投影式液晶顯示器的應用zh_TW
dc.titleFabrication of UHVCVD Low Temperature Poly-Si TFTs and Its Applications to Projection Liquid Crystal displayen_US
dc.typePlanen_US
dc.contributor.department國立交通大學毫微米實驗室zh_TW
Appears in Collections:Research Plans