完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 張鼎張 | en_US |
dc.contributor.author | TING-CHANGCHANG | en_US |
dc.date.accessioned | 2014-12-13T10:36:40Z | - |
dc.date.available | 2014-12-13T10:36:40Z | - |
dc.date.issued | 1999 | en_US |
dc.identifier.govdoc | NSC88-2215-E317-009 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/94093 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=428670&docId=76707 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.subject | 高真空 | zh_TW |
dc.subject | 化學氣相沈積法 | zh_TW |
dc.subject | 多晶矽 | zh_TW |
dc.subject | 薄膜電晶體 | zh_TW |
dc.subject | High Vacuum | en_US |
dc.subject | Chemical vapor deposition (CVD) | en_US |
dc.subject | Polycrystalline silicon | en_US |
dc.subject | Thin film transistor (TFT) | en_US |
dc.title | 超高真空化學氣相沈積低溫新穎複晶矽薄膜電晶體的製作與可靠度之研究---子計畫I:化學氣相沈積系統成長低溫複晶矽薄膜電晶體及其在投影式液晶顯示器的應用 | zh_TW |
dc.title | Fabrication of UHVCVD Low Temperature Poly-Si TFTs and Its Applications to Projection Liquid Crystal display | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 國立交通大學毫微米實驗室 | zh_TW |
顯示於類別: | 研究計畫 |