利用同步輻射光源對三五族氮化物半導體薄膜之特性研究

Full metadata record

DC Field	Value	Language
dc.contributor.author	陳文雄	en_US
dc.date.accessioned	2014-12-13T10:37:06Z	-
dc.date.available	2014-12-13T10:37:06Z	-
dc.date.issued	1999	en_US
dc.identifier.govdoc	NSC88-2112-M009-031	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/94381	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=426407&docId=76151	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	三五族氮化合物	zh_TW
dc.subject	同步輻射光源	zh_TW
dc.subject	X射線吸收的精細結構光譜	zh_TW
dc.subject	X射線駐波	zh_TW
dc.subject	III-V nitride	en_US
dc.subject	Synchrotron radiation	en_US
dc.subject	X-ray absorption fine structure (XAFS)	en_US
dc.subject	X-ray standing wave (XSW)	en_US
dc.title	利用同步輻射光源對三五族氮化物半導體薄膜之特性研究	zh_TW
dc.title	Synchrotron Radiation Characterization of III-V Nitride Semiconductor Films	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學電子物理系	zh_TW
Appears in Collections:	Research Plans

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