利用同步輻射光源對三五族氮化物半導體薄膜之特性研究

標題:	利用同步輻射光源對三五族氮化物半導體薄膜之特性研究 Synchrotron Radiation Characterization of III-V Nitride Semiconductor Films
作者:	陳文雄交通大學電子物理系
關鍵字:	三五族氮化合物;同步輻射光源;X射線吸收的精細結構光譜;X射線駐波;III-V nitride;Synchrotron radiation;X-ray absorption fine structure (XAFS);X-ray standing wave (XSW)
公開日期:	1999
官方說明文件#:	NSC88-2112-M009-031
URI:	http://hdl.handle.net/11536/94381 https://www.grb.gov.tw/search/planDetail?id=426407&docId=76151
Appears in Collections:	Research Plans

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