鋁栓塞製程於深次微米元件之應用研究(II)

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	吳文發	en_US
dc.date.accessioned	2014-12-13T10:37:06Z	-
dc.date.available	2014-12-13T10:37:06Z	-
dc.date.issued	1999	en_US
dc.identifier.govdoc	NSC88-2215-E317-001	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/94382	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=428974&docId=76776	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	深次微米	zh_TW
dc.subject	鋁栓	zh_TW
dc.subject	多層互連	zh_TW
dc.subject	平坦化	zh_TW
dc.subject	擴散障礙層	zh_TW
dc.subject	電漿處理	zh_TW
dc.subject	接觸電阻	zh_TW
dc.subject	鋁濺鍍	zh_TW
dc.subject	Deep submicrometer	en_US
dc.subject	Al plug	en_US
dc.subject	Multilevel interconnect	en_US
dc.subject	Planarization	en_US
dc.subject	Diffusion barrier	en_US
dc.subject	Plasma treatment	en_US
dc.subject	Contact resistance	en_US
dc.subject	Al sputtering	en_US
dc.title	鋁栓塞製程於深次微米元件之應用研究(II)	zh_TW
dc.title	Applications of Al Plug for Deep Sub-Micron Devices (II)	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學毫微米實驗室	zh_TW
顯示於類別：	研究計畫