完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 鄭晃忠 | en_US |
dc.contributor.author | CHENG HUANG-CHUNG | en_US |
dc.date.accessioned | 2014-12-13T10:37:14Z | - |
dc.date.available | 2014-12-13T10:37:14Z | - |
dc.date.issued | 1999 | en_US |
dc.identifier.govdoc | NSC88-2215-E009-055 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/94467 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=429005&docId=76783 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.subject | 雙極性電晶體 | zh_TW |
dc.subject | 雙擴散金氧半導體 | zh_TW |
dc.subject | 磊晶矽 | zh_TW |
dc.subject | 液晶 | zh_TW |
dc.subject | 驅動電路 | zh_TW |
dc.subject | Bipolar transistor | en_US |
dc.subject | DMOS | en_US |
dc.subject | Epitaxy silicon | en_US |
dc.subject | Liquid crystal | en_US |
dc.subject | Driver | en_US |
dc.title | 應用於類比電路之整合式雙極性/互補金氧半元件/擴散式金氧半元件技術之開發---子計畫II:在雙極性/互補式金氧半/雙擴散金氧半(BCD)技術中雙擴散金氧半(DMOS)之最佳化設計與製造(I) | zh_TW |
dc.title | Optimal DMOS Design and Fabricaion in BCD Technology (I) | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 交通大學電子工程系 | zh_TW |
顯示於類別: | 研究計畫 |