完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 陳茂傑 | en_US |
dc.date.accessioned | 2014-12-13T10:37:58Z | - |
dc.date.available | 2014-12-13T10:37:58Z | - |
dc.date.issued | 2001 | en_US |
dc.identifier.govdoc | NSC90-2215-E009-096 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/94987 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=665788&docId=126395 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.subject | 化學氣相沈積法 | zh_TW |
dc.subject | 銅膜 | zh_TW |
dc.subject | 積體電路製造 | zh_TW |
dc.subject | CVD | en_US |
dc.subject | Copper film | en_US |
dc.subject | Integrated circuit fabrication | en_US |
dc.title | 實用銅膜之化學氣相沈積技術研究 | zh_TW |
dc.title | Study and Development of Practical Copper Film Deposition by CVD Method | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 交通大學電子工程系 | zh_TW |
顯示於類別: | 研究計畫 |