Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 王念夏 | en_US |
dc.contributor.author | WANG NIANN SHIAH | en_US |
dc.date.accessioned | 2014-12-13T10:38:08Z | - |
dc.date.available | 2014-12-13T10:38:08Z | - |
dc.date.issued | 1998 | en_US |
dc.identifier.govdoc | NSC87-2113-M009-007-L1 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/95094 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=342636&docId=61228 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.subject | 氟氯烷取代物 | zh_TW |
dc.subject | 硫化合物 | zh_TW |
dc.subject | 甲硫基 | zh_TW |
dc.subject | 反應速率 | zh_TW |
dc.subject | 光化學 | zh_TW |
dc.subject | Freon substitute | en_US |
dc.subject | Sulfur compound | en_US |
dc.subject | Methyl sulfur | en_US |
dc.subject | Reaction speed | en_US |
dc.subject | Photochemistry | en_US |
dc.title | 以雷射技術研究大氣化學之重要分子---子計畫三:(I)氟氮烷取代物研究---與Cl之應速率(2)硫化物氧化研究---CH3S與NO2或O2之反應速率(II) | zh_TW |
dc.title | (1)Freon Substitutes-Reaction Rates with Cl (2)Oxidation of Sulfur Compounds-Reaction Rate of CH/sub 3/S with NO/sub 2/ or O/sub 2/ (II) | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 交通大學應用化學系 | zh_TW |
Appears in Collections: | Research Plans |