限制驅導排程方法在晶圓廠黃光區之應用

Full metadata record

DC Field	Value	Language
dc.contributor.author	李榮貴	en_US
dc.contributor.author	LI RONG-KWEI	en_US
dc.date.accessioned	2014-12-13T10:38:15Z	-
dc.date.available	2014-12-13T10:38:15Z	-
dc.date.issued	2001	en_US
dc.identifier.govdoc	NSC90-2218-E009-020	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/95153	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=674289&docId=128525	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	晶圓製造	zh_TW
dc.subject	光刻術	zh_TW
dc.subject	限制理論	zh_TW
dc.subject	Wafer fabrication	en_US
dc.subject	Photolithography	en_US
dc.subject	Theory of constraint	en_US
dc.title	限制驅導排程方法在晶圓廠黃光區之應用	zh_TW
dc.title	An Application of TOC for Photolithography Area in Wafer Fabrication Factory	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學工業工程與管理學系	zh_TW
Appears in Collections:	Research Plans

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