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dc.contributor.authorLiang, C. -T.en_US
dc.contributor.authorTseng, Yen Shungen_US
dc.contributor.authorWu, Jau-Yangen_US
dc.contributor.authorLin, Sheng-Dien_US
dc.contributor.authorYang, Chun-Kaien_US
dc.contributor.authorLi, Yu-Ruen_US
dc.contributor.authorChen, Kuang Yaoen_US
dc.contributor.authorLin, Po-Tsunen_US
dc.contributor.authorLin, Li-Hungen_US
dc.date.accessioned2014-12-08T15:12:25Z-
dc.date.available2014-12-08T15:12:25Z-
dc.date.issued2008-03-31en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2906360en_US
dc.identifier.urihttp://hdl.handle.net/11536/9546-
dc.description.abstractMagnetoresistivity measurements on a gated AlGaAs/GaAs high electron mobility transistor (HEMT) structure were performed at high temperatures T. By changing the applied gate voltage V(g), we can investigate the observed huge positive magnetoresistance (PMR) at different effective disorder and density inhomogeneity within the same HEMT structure. The observed PMR value increases with increasing disorder in the depletion mode (V(g)<= 0). Moreover, the PMR value is not limited by the quality of the HEMT structure at T=80 K. Such results pave the way for low-cost, high-throughput GaAs-based HEMT fabrication for future magnetic sensing and recording devices fully compatible with the mature HEMT technology. (C) 2008 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleHuge positive magnetoresistance in a gated AlGaAs/GaAs high electron mobility transistor structure at high temperaturesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2906360en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume92en_US
dc.citation.issue13en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000254669900045-
dc.citation.woscount1-
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