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dc.contributor.authorOu, Chun-Weien_US
dc.contributor.authorHo, Zhong Yoen_US
dc.contributor.authorChuang, You-Cheen_US
dc.contributor.authorCheng, Shiau-Shinen_US
dc.contributor.authorWu, Meng-Chyien_US
dc.contributor.authorHo, Kuo-Chuanen_US
dc.contributor.authorChu, Chih-Weien_US
dc.date.accessioned2014-12-08T15:12:26Z-
dc.date.available2014-12-08T15:12:26Z-
dc.date.issued2008-03-24en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2898217en_US
dc.identifier.urihttp://hdl.handle.net/11536/9558-
dc.description.abstractIn this article, we report the fabrication of SnO(2) thin film transistors (TFTs) fabricated by reactive evaporation. Different from the previous reports, the fabricated TFTs exhibit p-type conductivity in its undoped form. The postdeposition annealing temperature was tuned to achieve p-channel SnO(2) TFTs. The on/ off ratio and the field-effect mobility were similar to 10(3) and 0.011 cm(2)/V s, respectively. To demonstrate inverter circuit, two devices with different threshold voltages were combined and an output gain of 2.8 was achieved. The realization of p-channel oxide TFTs would open up new challenges in the area of transparent electronics. (C) 2008 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleAnomalous p-channel amorphous oxide transistors based on tin oxide and their complementary circuitsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2898217en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume92en_US
dc.citation.issue12en_US
dc.citation.epageen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000254510300051-
dc.citation.woscount18-
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