完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Ou, Chun-Wei | en_US |
dc.contributor.author | Ho, Zhong Yo | en_US |
dc.contributor.author | Chuang, You-Che | en_US |
dc.contributor.author | Cheng, Shiau-Shin | en_US |
dc.contributor.author | Wu, Meng-Chyi | en_US |
dc.contributor.author | Ho, Kuo-Chuan | en_US |
dc.contributor.author | Chu, Chih-Wei | en_US |
dc.date.accessioned | 2014-12-08T15:12:26Z | - |
dc.date.available | 2014-12-08T15:12:26Z | - |
dc.date.issued | 2008-03-24 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.2898217 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/9558 | - |
dc.description.abstract | In this article, we report the fabrication of SnO(2) thin film transistors (TFTs) fabricated by reactive evaporation. Different from the previous reports, the fabricated TFTs exhibit p-type conductivity in its undoped form. The postdeposition annealing temperature was tuned to achieve p-channel SnO(2) TFTs. The on/ off ratio and the field-effect mobility were similar to 10(3) and 0.011 cm(2)/V s, respectively. To demonstrate inverter circuit, two devices with different threshold voltages were combined and an output gain of 2.8 was achieved. The realization of p-channel oxide TFTs would open up new challenges in the area of transparent electronics. (C) 2008 American Institute of Physics. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Anomalous p-channel amorphous oxide transistors based on tin oxide and their complementary circuits | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.2898217 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 92 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000254510300051 | - |
dc.citation.woscount | 18 | - |
顯示於類別: | 期刊論文 |