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dc.contributor.author蘇翔en_US
dc.date.accessioned2014-12-13T10:38:44Z-
dc.date.available2014-12-13T10:38:44Z-
dc.date.issued1996en_US
dc.identifier.govdocNSC85-2215-E009-009zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/95616-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=229981&docId=41767en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subjectX光zh_TW
dc.subject光罩zh_TW
dc.subject鼓膜zh_TW
dc.subject吸收劑zh_TW
dc.subject碳化矽zh_TW
dc.subject鑽石膜zh_TW
dc.subject深寬比zh_TW
dc.subject聚焦環zh_TW
dc.subjectX-rayen_US
dc.subjectMasksen_US
dc.subjectMembraneen_US
dc.subjectAbsorberen_US
dc.subjectSilicon carbideen_US
dc.subjectDiamond filmen_US
dc.subjectAspect ratioen_US
dc.subjectFresnel zone platesen_US
dc.title以深蝕光刻術製作聚焦環---子計畫一：聚焦環之中間光罩製作zh_TW
dc.titleFrabrication of Intermediate Masks for Fresnel Zone Platesen_US
dc.typePlanen_US
dc.contributor.department國立交通大學電子工程學系zh_TW
Appears in Collections:Research Plans


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