| 標題: | 以深蝕光刻術製作聚焦環---總計畫 Fresnel Zone Plate Via Deep X-Ray Lithography |
| 作者: | 蘇翔 國立交通大學電子工程研究所 |
| 關鍵字: | 同步輻射;深蝕光刻術;Synchrotron radiation;Deep X-ray lithography |
| 公開日期: | 1996 |
| 官方說明文件#: | NSC85-2215-E009-008 |
| URI: | http://hdl.handle.net/11536/95615 https://www.grb.gov.tw/search/planDetail?id=229976&docId=41766 |
| 顯示於類別： | 研究計畫 |
- 以深蝕光刻術製作聚焦環---總計畫 / 蘇翔
- 以深蝕光刻術製作聚焦環---子計畫一：聚焦環之中間光罩製作 / 蘇翔
- 高感度SU-8光阻之超深X光光刻技術研究 / 劉昆沛;Kun-Pei Liu;周長彬;許博淵;Chang-Pin Chou
- High precision, low cost mask for deep x-ray lithography / Shew, BY;Cheng, Y;Shih, WP;Lu, M;Lee, WH
- Fabrication of intermediate mask for deep x-ray lithography / Sheu, JT;Chiang, MH;Su, S
- Development behaviours and microstructure quality of downward-development in deep x-ray lithography / Cheng, CM;Chen, RH
- High precision, low cost mask for deep x-ray lithography / Shew, BY;Cheng, Y;Shih, WP;Lu, M;Lee, WH
- Oxygen quenching effect in ultra-deep X-ray lithography with SU-8 resist / Shew, BY;Huang, TY;Liu, KP;Chou, CP
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