標題: Development behaviours and microstructure quality of downward-development in deep x-ray lithography
作者: Cheng, CM
Chen, RH
機械工程學系
Department of Mechanical Engineering
公開日期: 1-十一月-2001
摘要: This paper presents a novel development method for fabricating high aspect ratio microstructures in deep x-ray lithography. In this method, microstructures are developed downward to utilize the difference of the specific weight between the development products and the developer to efficiently remove the development products. The development behaviours of the proposed method (downward-development) are investigated and compared with the conventional method (upward-development). Experimental results indicate that the developing rate of downward-development is approximately twice that obtained by upward-development. Additionally, the development products are easily removed and a satisfactory microstructure quality is achieved via this process. The proposed method also yields accurate predictability to estimate the necessary developing time. Moreover, the elevated temperature increases the developing rate of downward-development more sensitively than for upward-development.
URI: http://dx.doi.org/10.1088/0960-1317/11/6/310
http://hdl.handle.net/11536/29312
ISSN: 0960-1317
DOI: 10.1088/0960-1317/11/6/310
期刊: JOURNAL OF MICROMECHANICS AND MICROENGINEERING
Volume: 11
Issue: 6
起始頁: 692
結束頁: 696
顯示於類別:期刊論文


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