以深蝕光刻術製作聚焦環---子計畫一：聚焦環之中間光罩製作

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	蘇翔	en_US
dc.date.accessioned	2014-12-13T10:38:44Z	-
dc.date.available	2014-12-13T10:38:44Z	-
dc.date.issued	1996	en_US
dc.identifier.govdoc	NSC85-2215-E009-009	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/95616	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=229981&docId=41767	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	X光	zh_TW
dc.subject	光罩	zh_TW
dc.subject	鼓膜	zh_TW
dc.subject	吸收劑	zh_TW
dc.subject	碳化矽	zh_TW
dc.subject	鑽石膜	zh_TW
dc.subject	深寬比	zh_TW
dc.subject	聚焦環	zh_TW
dc.subject	X-ray	en_US
dc.subject	Masks	en_US
dc.subject	Membrane	en_US
dc.subject	Absorber	en_US
dc.subject	Silicon carbide	en_US
dc.subject	Diamond film	en_US
dc.subject	Aspect ratio	en_US
dc.subject	Fresnel zone plates	en_US
dc.title	以深蝕光刻術製作聚焦環---子計畫一：聚焦環之中間光罩製作	zh_TW
dc.title	Frabrication of Intermediate Masks for Fresnel Zone Plates	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學電子工程學系	zh_TW
顯示於類別：	研究計畫