完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 莊振益 | en_US |
dc.date.accessioned | 2014-12-13T10:38:46Z | - |
dc.date.available | 2014-12-13T10:38:46Z | - |
dc.date.issued | 1996 | en_US |
dc.identifier.govdoc | NSC85-2112-M009-038-PH | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/95658 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=239629&docId=44317 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.subject | 覆蓋層 | zh_TW |
dc.subject | 超導薄膜 | zh_TW |
dc.subject | 腔內補償裝置 | zh_TW |
dc.subject | 即時雙鎗交流濺鍍系統 | zh_TW |
dc.subject | 維度各向異性 | zh_TW |
dc.subject | 臨界電流密度 | zh_TW |
dc.subject | Capsulation layer | en_US |
dc.subject | Superconducting thin film | en_US |
dc.subject | In-chamber compensation setup | en_US |
dc.subject | Dual-gun in-situ RF sputtering | en_US |
dc.subject | Dimensionality anisotropy | en_US |
dc.subject | Critical currentdensity | en_US |
dc.title | 薄膜超導元件的研制與特性探討---子計畫四:鉈系1223相超導薄膜之製備與特性研究(II) | zh_TW |
dc.title | A Study on the Fabrication and Properties of Tl-1223 Superconducting Thin Films(II) | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 國立交通大學電子物理學系 | zh_TW |
顯示於類別: | 研究計畫 |