| 標題: | 嵌附調細式相移光罩研製 Fabrication of an Embedded Attenuated Phase-Shifting Mask |
| 作者: | 龍文安 Loong Wen-an 國立交通大學應用化學研究所 |
| 關鍵字: | 相光移罩;調細相移光罩;微影成像;步進機;吸光相移層;Phase-shifting mask;APSM;Microlithography;Stepper;Absorptive shifter |
| 公開日期: | 1996 |
| 官方說明文件#: | NSC85-2215-E009-063 |
| URI: | http://hdl.handle.net/11536/96026 https://www.grb.gov.tw/search/planDetail?id=234554&docId=43051 |
| Appears in Collections: | Research Plans |
- 嵌附式減光式相移光罩之模擬與製備 / 龍文安;Loong Wen-an
- 嵌附式減光型相移圖罩之模擬與製備 / 龍文安;Loong Wen-an
- 嵌附減光式相移光罩吸光相移層研製 / 龍文安;Loong Wen-an
- 0.35-MU-M PATTERN FABRICATION USING QUARTZ-ETCH ATTENUATE PHASE-SHIFTING MASK IN AN I-LINE STEPPER WITH A 0.50-NA AND A 0.60-SIGMA / LOONG, WA;SHY, SL;LIN, YC
- TiNx as a new embedded material for attenuated phase shift mask / Loong, WA;Chen, TC;Tseng, JC
- TiSixOy as an absorptive shifter for embedded phase-shifting mask in 248 nm and the modification of R-T method for the determination of shifter's n and k / Loong, WA;Chen, CW;Chang, YH;Lin, CM;Cui, Z
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