| 標題: | 0.25-0.35微米圖案轉移用石英蝕刻調細式相移光罩之最佳化模擬及其研製 Optimization by Simulation and Its Fabrication of a Quartz-Etch Attenuate Phase Shifting Mask for 0.25-0.35.mu.m Pattern Transfer |
| 作者: | 龍文安 Loong Wen-an 國立交通大學應用化學研究所 |
| 公開日期: | 1995 |
| 官方說明文件#: | NSC84-2215-E009-051 |
| URI: | http://hdl.handle.net/11536/96348 https://www.grb.gov.tw/search/planDetail?id=172228&docId=29261 |
| 顯示於類別： | 研究計畫 |
- 0.35-MU-M PATTERN FABRICATION USING QUARTZ-ETCH ATTENUATE PHASE-SHIFTING MASK IN AN I-LINE STEPPER WITH A 0.50-NA AND A 0.60-SIGMA / LOONG, WA;SHY, SL;LIN, YC
- 石英蝕刻調細式相移光罩之模擬與研製 / 林雍秩;Lin Yung-chih;龍文安;Dr.Loong Wen-an
- SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM / LOONG, WA;SHY, SL;GUO, GC;CHOU, YL
- Chemical stability of embedded material for attenuated phase-shifting mask and application of high-transmittance attenuated phase-shifting mask for 0.1 mu m contact pattern in 193 nm lithography / Lin, CM;Loong, WA
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