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dc.contributor.authorZan, Hsiao Wenen_US
dc.contributor.authorChou, Cheng-Weien_US
dc.contributor.authorYen, Kuo-Hsien_US
dc.date.accessioned2014-12-08T15:12:34Z-
dc.date.available2014-12-08T15:12:34Z-
dc.date.issued2008-02-29en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2007.08.003en_US
dc.identifier.urihttp://hdl.handle.net/11536/9649-
dc.description.abstractThis study elucidates the patterning of pentacene by adjusting its surface energy. The surface energy was modified by self-assembled monolayer treatment and exposure to ultra-violet (UV) light through a quartz-glass mask. Then, following pentacene deposition, dipping in water was used to remove pentacene from the UV-exposed area. The adhesion energy and the intrusion energy were analyzed to determine the mechanism of this patterning process. The variation of the intrusion energy with the surface energy was found to be the main issue in pentacene patterning. The characteristics of pentacene-organic thin film transistors were also measured to confirm the proposed method. (C) 2007 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectpentaceneen_US
dc.subjectsurface energyen_US
dc.subjectSAMen_US
dc.titleSurface energy and adhesion energy of solution-based patterning in organic thin film transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.tsf.2007.08.003en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume516en_US
dc.citation.issue8en_US
dc.citation.spage2231en_US
dc.citation.epage2236en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000253872200091-
dc.citation.woscount5-
Appears in Collections:Articles


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