標題: Pentacene patterning on aluminum nitride by water dipping
作者: Zan, Hsiao-Wen
Chou, Cheng-Wei
Wang, Chung-Hwa
Yen, Kuo-Hsi
Hwang, Jenn-Chang
光電工程學系
顯示科技研究所
Department of Photonics
Institute of Display
公開日期: 2008
摘要: This study reports a pentacene patterning method that can be combined with conventional lithography to pattern pentacene film. The aluminum nitride (AlN) surface was patterned using a conventional photolithography process and then treated with oxygen (O(2)) plasma on uncovered AlN to modify surface polarity. Following pentacene deposition, the sample was dipped in water to remove pentacene from the O(2) plasma-treated area. The O(2) plasma-treated AlN surface was analyzed using X-ray photoelectron spectroscopy (XPS) before pentacene deposition. The polar surface energy changed from 13.2 to 114.4 mJ/m(2) when the AlN surface was treated with O(2) plasma at 100 W for 10 min. The polar surface energy was attributed to the increase of Al-O bonds on the surface based on XPS measurements. The intrusion energy of water was enhanced from 34.5 to 140.4 mJ/m(2) due to the polar surface energy induced by the O(2) plasma treatment. The enhancement of water intrusion energy and the polar surface energy explains the water-removable pentacene patterning mechanism. (C) 2008 The Electrochemical Society.
URI: http://hdl.handle.net/11536/9904
http://dx.doi.org/10.1149/1.2976894
ISSN: 0013-4651
DOI: 10.1149/1.2976894
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 155
Issue: 11
起始頁: J321
結束頁: J325
顯示於類別:期刊論文


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