標題: New patterning method for pentacene-based TFTs by using AIN dielectric and O-2 plasma treatment
作者: Zan, Hsiao Wen
Tu, Ting Yuan
Chou, Cheng Wei
Yen, Kuo Hsi
Wang, Chung Hwa
Hwang, Jenn Chang
Hsu, Chen Chou
Lin, Kun Chih
Gan, F. Y.
光電工程學系
Department of Photonics
關鍵字: OTFTs;AIN;pentacene;high-k;sputtering;contact angle;surface energy
公開日期: 2007
摘要: Pentacene patterning on aluminum nitride (AIN) dielectric by adjusting the surface energy was discussed. By using conventional photo resist to protect the channel area, the surface energy of the remaining area was altered by the 02 plasma treatment. Then, after pentacene deposition, water dipping was used to remove the pentacene on 02 plasma-treated area. The adhesion energy, intrusion energy were analyzed to explain the mechanism of this patterning process. The variation of intrusion energy due to different surface energies was found to be the key issue for successful pentacene patterning. AIN-OTFTs with the proposed pentacene patterning technology were also demonstrated.
URI: http://hdl.handle.net/11536/9445
ISBN: 978-957-28522-4-8
期刊: IDMC'07: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2007
起始頁: 739
結束頁: 742
顯示於類別:會議論文