標題: | Growth of a-plane ZnO thin films on LaAlO3(100) substrate by metal-organic chemical vapor deposition |
作者: | Tian, Jr-Sheng Liang, Mel-Hui Ho, Yen-Teng Liu, Yuan-An Chang, Li 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | high resolution x-ray diffraction;metalorganic chemical vapor deposition;oxides;semiconducting II-VI materials |
公開日期: | 15-二月-2008 |
摘要: | ZnO(1 1 (2) over bar 0) thin films were successfully grown on LaAlO3 (lanthanum aluminate) (10 0) substrate by atmospheric pressure metalorganic chemical vapor deposition. X-ray diffraction, atomic force microscopy, and scanning electron microscopy showed that ZnO films formed at 450 degrees C were composed of almost all (1 1 (2) over bar 0) oriented grains while (0 0 0 2) oriented ZnO grains started to appear at temperature above 550 degrees C. The a-plane ZnO films consisted of two types of domains with their c-axis perpendicular to each other due to LaAlO3(1 0 0) symmetry with low lattice mismatch along < 1 1 0 >. (C) 2007 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.jcrysgro.2007.11.073 http://hdl.handle.net/11536/9672 |
ISSN: | 0022-0248 |
DOI: | 10.1016/j.jcrysgro.2007.11.073 |
期刊: | JOURNAL OF CRYSTAL GROWTH |
Volume: | 310 |
Issue: | 4 |
起始頁: | 777 |
結束頁: | 782 |
顯示於類別: | 期刊論文 |