完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 謝宗雍 | en_US |
| dc.contributor.author | HSIEH TSUNG-EONG | en_US |
| dc.date.accessioned | 2014-12-13T10:39:49Z | - |
| dc.date.available | 2014-12-13T10:39:49Z | - |
| dc.date.issued | 2001 | en_US |
| dc.identifier.govdoc | NSC90-2216-E009-033 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/96830 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=673266&docId=128266 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 多層基板 | zh_TW |
| dc.subject | 低介電材料 | zh_TW |
| dc.subject | 製備 | zh_TW |
| dc.subject | 材料性質 | zh_TW |
| dc.subject | 高密度 | zh_TW |
| dc.subject | Multilayer substrate | en_US |
| dc.subject | Low dielectric material | en_US |
| dc.subject | Preparation | en_US |
| dc.subject | Material property | en_US |
| dc.subject | High density | en_US |
| dc.title | 高密度多層構裝基板與接合材料研究---子計畫III：新型低介電係數材料之製備及其性質研究(III) | zh_TW |
| dc.title | Prreparation of New Low Dielectric Constant Material and Study of Relevant Properties (III) | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 國立交通大學材料科學與工程學系 | zh_TW |
| 顯示於類別： | 研究計畫 | |
