完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 林明璋 | en_US |
| dc.contributor.author | LIN MING CHANG | en_US |
| dc.date.accessioned | 2014-12-13T10:40:03Z | - |
| dc.date.available | 2014-12-13T10:40:03Z | - |
| dc.date.issued | 2012 | en_US |
| dc.identifier.govdoc | NSC101-2113-M009-002 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/97101 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=2674767&docId=401481 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.title | 建立模擬非晶形矽薄膜沉積的化學動力學資料庫(2/3) | zh_TW |
| dc.title | Chemical Kinetics Database for Simulations of a-Si:H Thin Film Growth | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 國立交通大學應用化學系（所） | zh_TW |
| 顯示於類別： | 研究計畫 | |
- 建立模擬非晶形矽薄膜沉積的化學動力學資料庫( III ) / 林明璋;LIN MING CHANG
- 建立模擬非晶形矽薄膜沉積的化學動力學資料庫( I ) / 林明璋;LIN MING CHANG
- Ab Initio Chemical Kinetics for SiH(3) Reactions with Si(x)H(2x+2) (x=1-4) / Raghunath, P.;Lin, M. C.
- Ab Initio Chemical Kinetics for SiH3 Reactions with SixH2x+2 (x=1-4) / Raghunath, P.;Lin, M. C.
- Ab Initio Chemical Kinetics for SiHx Reactions with Si2Hy (x=1,2,3,4; y=6,5,4,3; x plus y=7) under a-Si:H CVD Condition / Trong-Nghia Nguyen;Lin, M. C.
- Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH4 (+) Ion and Related Reverse Ion-Molecule Reactions of Interest to PECVD of a-Si:H Films / Nguyen, T. N.;Lee, Y. M.;Wu, J. S.;Lin, M. C.
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