完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lee, Wei | en_US |
dc.contributor.author | Su, Pin | en_US |
dc.contributor.author | Su, Ke-Wei | en_US |
dc.contributor.author | Chiang, Chung-Shi | en_US |
dc.contributor.author | Liu, Sally | en_US |
dc.date.accessioned | 2014-12-08T15:12:40Z | - |
dc.date.available | 2014-12-08T15:12:40Z | - |
dc.date.issued | 2008-02-01 | en_US |
dc.identifier.issn | 0894-6507 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/TSM.2007.914374 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/9747 | - |
dc.description.abstract | This paper investigates anomalous inversion capacitance-voltage (C-V) attenuation for MOSFETs with leaky dielectrics. We propose to reconstruct the inversion C-V characteristic based on long-channel MOSFETs using the concept of intrinsic input resistance (R-ii). The concept of R-ii has been validated by segmented BSIM4/SPICE simulation. Our reconstructed C-V characteristics show poly-depletion effects, which are not visible in the two-frequency three-element method and agree well with the North Carolina State University-CVC simulation results. The intrinsic input resistance dominates the overall gate-current-induced debiasing effect (similar to 95% for L = 20 mu m) and can be extracted directly from the I-V characteristics. Due to its simplicity, our proposed R-ii approach may provide an option for regular process monitoring purposes. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | capacitance-voltage (C-V) | en_US |
dc.subject | intrinsic input resistance | en_US |
dc.subject | metal-oxide-emiconductor (MOS) capacitance | en_US |
dc.subject | MOSFET | en_US |
dc.subject | ultrathin gate oxide | en_US |
dc.title | Investigation of anomalous inversion C-V characteristics for long-channel MOSFETs with leaky dielectrics: Mechanisms and reconstruction | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/TSM.2007.914374 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | en_US |
dc.citation.volume | 21 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 104 | en_US |
dc.citation.epage | 109 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000253101700013 | - |
dc.citation.woscount | 2 | - |
顯示於類別: | 期刊論文 |