Mixed-metal oxide films via a heterobimetallic complex as an MOCVD single-source precursor

標題:	Mixed-metal oxide films via a heterobimetallic complex as an MOCVD single-source precursor
作者:	Shyu, SG Wu, JS Chuang, SH Chi, KM Sung, YS 應用化學系 Department of Applied Chemistry
公開日期:	7-Oct-1996
摘要:	A single-phase polycrystalline mixed-metal oxide WCoO4 film on Si(100) can be prepared by MOCVD with the use of [(eta-C5H5)(CO)(3)WCo(CO)(4)] as a single-source precursor.
URI:	http://dx.doi.org/10.1039/cc9960002239 http://hdl.handle.net/11536/982
ISSN:	1359-7345
DOI:	10.1039/cc9960002239
期刊:	CHEMICAL COMMUNICATIONS
Volume:
Issue:	19
起始頁:	2239
結束頁:	2240
Appears in Collections:	Articles

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