| 標題: | CMOS發光顯像技術與閘極介電層材料研究---中加合作案(I) CMOS Luminescence Imaging Technique and Advanced Gate Dielectrics Research(I) |
| 作者: | 汪大暉 WANG TAHUI 國立交通大學電子工程學系 |
| 公開日期: | 2000 |
| 官方說明文件#: | NSC89-2215-E009-072 |
| URI: | http://hdl.handle.net/11536/98583 https://www.grb.gov.tw/search/planDetail?id=573694&docId=107121 |
| 顯示於類別： | 研究計畫 |
- CMOS發光顯像技術與閘極介電層材料研究---中加合作案(II) / 汪大暉;WANG TAHUI
- 靴帶式之寬動態範圍4T架構CMOS生醫影像感測器 / 李俊彥;Lee, Chun-Yen;林進燈;Lin, Chin-Teng
- The RTN Measurement Technique on Leakage Path Finding in Advanced High-k Metal Gate CMOS Devices / Hsieh, E. R.;Lu, P. Y.;Chung, Steve S.;Ke, J. C.;Yang, C. W.
- The Path Finding of Gate Dielectric Breakdown in Advanced High-k Metal-Gate CMOS Devices / Chung, Steve
- 高介電係數介電質與金屬閘極製程技術之研究與應用 / 洪彬舫;Bing-Fang Hung;荊鳳德;Albert Chin
- Characterizing fluorine-ion implant effects on poly-Si thin-film transistors with Pr2O3 gate dielectric / Chang, Chia-Wen;Deng, Chih-Kang;Wu, Shih-Chieh;Huang, Jiun-Jia;Chang, Hong-Ren
Loading...