標題: | Effects of Hydrogen Plasma Treatment on Field-Emission Characteristics of Palladium Nanogap Emitters |
作者: | Tsai, Chih-Hao Chen, Kuan-Jung Pan, Fu-Ming Lo, Hsiang-Yu Li, Yiming Chiang, Mei-Chao Mo, Chi-Neng 材料科學與工程學系 電信工程研究所 Department of Materials Science and Engineering Institute of Communications Engineering |
公開日期: | 2008 |
摘要: | Nanogaps were prepared on the Pd line electrode by focused ion beam, and electron field-emission characteristics of the Pd nanogap emitter subject to hydrogen plasma treatment were studied. The as-prepared nanogap had smooth and uniform gap edges, and thus field-emission characteristics of the nanogap emitter were primarily dependent on the gap separation. After the hydrogen plasma treatment, the field-emission property of the Pd nanogap emitter was significantly enhanced. The improvement in the field-emission property was mainly attributed to formation of a ragged morphology on the nanogap emitter during the hydrogen plasma treatment. The ragged morphology provided more emitting sites with a high field enhancement factor. The Fowler-Nordheim plot was used to elucidate the dependence of field-emission characteristics of the Pd nanogap emitter on the plasma-induced ragged morphology. (C) 2008 The Electrochemical Society. [DOI: 10.1149/1.2988646] All rights reserved. |
URI: | http://hdl.handle.net/11536/9905 http://dx.doi.org/10.1149/1.2988646 |
ISSN: | 0013-4651 |
DOI: | 10.1149/1.2988646 |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 155 |
Issue: | 12 |
起始頁: | J361 |
結束頁: | J364 |
顯示於類別: | 期刊論文 |