完整後設資料紀錄
DC 欄位語言
dc.contributor.authorChen, Te-Mingen_US
dc.contributor.authorHung, Jui-Yien_US
dc.contributor.authorPan, Fu-Mingen_US
dc.contributor.authorChang, L.en_US
dc.contributor.authorSheu, J. -T.en_US
dc.contributor.authorWu, Shich-Chuanen_US
dc.date.accessioned2014-12-08T15:12:56Z-
dc.date.available2014-12-08T15:12:56Z-
dc.date.issued2008en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://hdl.handle.net/11536/9985-
dc.identifier.urihttp://dx.doi.org/10.1149/1.2835199en_US
dc.description.abstractWell-ordered titanium nitride nanorods were fabricated by reactive ion etch using titanium oxide nanodots as the mask, which were prepared using the anodic aluminum oxide templation method. The TiN nanorods exhibited a concave top surface with a protruding edge. Due to the protruding top edge and a high aspect ratio, the TiN nanorods showed a low turn-on voltage of 1.6 V/mu m. The ellipsoidal cylinder model was used to evaluate the field-enhancement effect of the protruding edge, and an underestimation by similar to 26% was found as compared with the enhancement factor derived from the Fowler-Nordheim plot. (C) 2008 The Electrochemical Society.en_US
dc.language.isoen_USen_US
dc.titleFabrication and field-emission characteristics of TiN nanorods with a concave top surfaceen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.2835199en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume11en_US
dc.citation.issue4en_US
dc.citation.spageK40en_US
dc.citation.epageK43en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department材料科學與工程學系奈米科技碩博班zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentGraduate Program of Nanotechnology , Department of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000253238000024-
dc.citation.woscount4-
顯示於類別:期刊論文