Interface Engineering for High-Performance Top-Gated MoS2 Field-Effect Transistors

Abstract

Experimental evidence of the optimized interface engineering effects in MoS2 transistors is demonstrated. The MoS2/Y2O3/HfO2 stack offers excellent interface control. Results show that HfO2 layer can be scaled down to 9 nm, yet achieving a near-ideal sub-threshold slope (65 mv/dec) and the highest saturation current (526 mu A/mu m) of any MoS2 transistor reported to date.