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A CHARACTERIZATION MODEL FOR CONSTANT CURRENT STRESSED VOLTAGE-TIME CHARACTERISTICS OF THIN THERMAL OXIDES GROWN ON SILICON SUBSTRATE

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1986-12-01

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10.1063/1.337515

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http://dx.doi.org/10.1063/1.337515
 https://ir.lib.nycu.edu.tw/handle/11536/4693

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期刊論文;;Articles

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