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Low-temperature grown graphene films by using molecular beam epitaxy

dc.citation.epageen_US
dc.citation.issue22en_US
dc.citation.volume101en_US
dc.citation.woscount7
dc.contributor.authorLin, Meng-Yuen_US
dc.contributor.authorGuo, Wei-Chingen_US
dc.contributor.authorWu, Meng-Hsunen_US
dc.contributor.authorWang, Pro-Yaoen_US
dc.contributor.authorLiu, Te-Huanen_US
dc.contributor.authorPao, Chun-Weien_US
dc.contributor.authorChang, Chien-Chengen_US
dc.contributor.authorLee, Si-Chenen_US
dc.contributor.authorLin, Shih-Yenen_US
dc.contributor.department光電學院zh_TW
dc.contributor.departmentCollege of Photonicsen_US
dc.date.accessioned2014-12-08T15:28:53Z
dc.date.available2014-12-08T15:28:53Z
dc.date.issued2012-11-26en_US
dc.description.abstractComplete graphene film is prepared by depositing carbon atoms directly on Cu foils in a molecular beam epitaxy chamber at 300 degrees C. The Raman spectrum of the film has indicated that high-quality few-layer graphene is obtained. With back-gated transistor architecture, the characteristic current modulation of graphene transistors is observed. Following the similar growth procedure, graphitization is observed at room temperature, which is consistent with the molecular dynamics simulations of graphene growth. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4768948]en_US
dc.identifier.doi10.1063/1.4768948en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4768948en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/20872
dc.identifier.wosnumberWOS:000311967000035
dc.language.isoen_USen_US
dc.titleLow-temperature grown graphene films by using molecular beam epitaxyen_US
dc.typeArticleen_US

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