An intelligent supervisory system for ion implantation in IC fabrication processes
| dc.citation.epage | 247 | en_US |
| dc.citation.issue | 2 | en_US |
| dc.citation.spage | 241 | en_US |
| dc.citation.volume | 7 | en_US |
| dc.citation.woscount | 3 | |
| dc.contributor.author | Shen, LC | en_US |
| dc.contributor.author | Hsu, PL | en_US |
| dc.contributor.department | 電控工程研究所 | zh_TW |
| dc.contributor.department | Institute of Electrical and Control Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:46:55Z | |
| dc.date.available | 2014-12-08T15:46:55Z | |
| dc.date.issued | 1999-02-01 | en_US |
| dc.description.abstract | This pager presents a real-time intelligent supervision system for IC ion implantation processes. A hardware interface is developed, to extract the features directly from the 2-D analog image signals of a beam map. A qualitative model for the beam scanning is then obtained, and the symptoms of abnormal operations can be analyzed to achieve on-line diagnosis. Furthermore, a fuzzy expert system is developed to advise operators on making appropriate adjustments for the beam scanning. This supervisory system has been implemented on Eaten NV-6200 A/AV ion implanters at the Taiwan Semiconductor Manufacturing Company. (C) 1999 Elsevier Science Ltd. All rights reserved. | en_US |
| dc.identifier.issn | 0967-0661 | en_US |
| dc.identifier.journal | CONTROL ENGINEERING PRACTICE | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/31525 | |
| dc.identifier.wosnumber | WOS:000079300200011 | |
| dc.language.iso | en_US | en_US |
| dc.subject | ion implantation | en_US |
| dc.subject | beam maps | en_US |
| dc.subject | supervision | en_US |
| dc.subject | feature extraction | en_US |
| dc.subject | symptom analysis | en_US |
| dc.subject | fuzzy expert systems | en_US |
| dc.title | An intelligent supervisory system for ion implantation in IC fabrication processes | en_US |
| dc.type | Article | en_US |