Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning
Loading...
Date
Journal Title
Journal ISSN
Volume Title
Publisher
DOI
10.1049/el:20000580
Abstract
A low contact-resistance poly-plug structure realised by in-situ HF-vapour cleaning in a clustered tool is described. The native oxide in the contact area can be efficiently removed by the combination of an HF-dipping and in-situ HF-vapour cleaning process, resulting in a low specific contact resistance.