Ultralow leakage In0.53Ga0.47As p-i-n photodetector grown on linearly graded metamorphic InxGa1-xP buffered GaAs substrate

dc.citation.epage752en_US
dc.citation.issue6en_US
dc.citation.spage749en_US
dc.citation.volume41en_US
dc.citation.woscount9
dc.contributor.authorLin, GRen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorLin, CKen_US
dc.contributor.authorFeng, Men_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:18:58Z
dc.date.available2014-12-08T15:18:58Z
dc.date.issued2005-06-01en_US
dc.description.abstractA novel top-illuminated In-0.53 Ga-0.47 As p-i-n photodiodes (MM-PINPD) grown on GaAs substrate by using linearly graded metamorphic InxGa1-xP (x graded from 0.49 to 1) buffer layer is reported. The dark current, optical responsivities, noise equivalent power, and operational bandwidth of the MM-PINPD with aperture diameter of 60 mu m are 13 pA, 0.6 A/W, 3.4 x 10(-15) W/Hz(1/2), and 7.5 GHz, respectively, at 1550 nm. The performances of the MM-PINPD on GaAs are demonstrated to be comparable to those of a similar device made on InGaAs-InP substrate.en_US
dc.identifier.doi10.1109/JQE.2005.847570en_US
dc.identifier.issn0018-9197en_US
dc.identifier.journalIEEE JOURNAL OF QUANTUM ELECTRONICSen_US
dc.identifier.urihttp://dx.doi.org/10.1109/JQE.2005.847570en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/13631
dc.identifier.wosnumberWOS:000229356600001
dc.language.isoen_USen_US
dc.subjectGaAsen_US
dc.subjectInGaPen_US
dc.subjectIn0.53Ga0.47Asen_US
dc.subjectmetamorphicen_US
dc.subjectp-i-n photodetectoren_US
dc.titleUltralow leakage In0.53Ga0.47As p-i-n photodetector grown on linearly graded metamorphic InxGa1-xP buffered GaAs substrateen_US
dc.typeArticleen_US

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