A silicon nanowire with a Coulomb blockade effect at room temperature
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DOI
10.1002/1521-4095(20020517)14:10<736
Abstract
An extremely narrow and thin silicon wire has been fabricated on a silicon-on-insulator wafer (see Figure). The room-temperature Coulomb blockade effects as well as the influence of a capacitively coupled gate on the transport properties of this conducting silicon quantum wire are studied. The results obtained are encouraging for the application of such wires in single-electron transistors.