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Interface effect of oxygen doping in polythiophene

dc.citation.epage1134en_US
dc.citation.issue12en_US
dc.citation.spage1131en_US
dc.citation.volume159en_US
dc.citation.woscount10
dc.contributor.authorLiu, Chien-Chengen_US
dc.contributor.authorYang, Chia-Mingen_US
dc.contributor.authorLiu, Wen-Hsingen_US
dc.contributor.authorLiao, Hua-Hsienen_US
dc.contributor.authorHorng, Sheng-Fuen_US
dc.contributor.authorMeng, Hsin-Feien_US
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.date.accessioned2014-12-08T15:09:24Z
dc.date.available2014-12-08T15:09:24Z
dc.date.issued2009-06-01en_US
dc.description.abstractLong-time evolution of the electrical characteristics for two-terminal and transistor of poly(3-hexylthiophene) film with various gate dielectric interfaces are measured. The oxygen doping is found to depend sensitively on the amount of hydroxyl groups of the interface and irreversible after long time in vacuum except for quartz. For a given interface, dip-coated film always has a higher doping level and slower de-doping than spin-coated films because of higher porosity. With careful control of the oxygen level transistor with mobility of 0.12 cm(2)/V s and on-off ratio of 29,000 are obtained for dip-coated film on glass substrate. (C) 2009 Elsevier B.V. All rights reserved.en_US
dc.identifier.doi10.1016/j.synthmet.2009.01.048en_US
dc.identifier.issn0379-6779en_US
dc.identifier.journalSYNTHETIC METALSen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.synthmet.2009.01.048en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/7177
dc.identifier.wosnumberWOS:000267838700003
dc.language.isoen_USen_US
dc.subjectPoly(3-hexylthiophene) transistoren_US
dc.subjectOn-off ratioen_US
dc.subjectGlass substrateen_US
dc.titleInterface effect of oxygen doping in polythiopheneen_US
dc.typeArticleen_US

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