應用於深次微米CMOS元件之閘極氧化層與複晶矽介電層之技術開發

Files

892215E009036.pdf (845.4 KB)

Date

Authors

URI

https://www.grb.gov.tw/search/planDetail?id=720334&docId=135306
https://ir.lib.nycu.edu.tw/handle/11536/100693

Collections

研究計畫;;Research Plans