Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode
| dc.citation.epage | 7302 | en_US |
| dc.citation.issue | 11 | en_US |
| dc.citation.spage | 7300 | en_US |
| dc.citation.volume | 46 | en_US |
| dc.citation.woscount | 12 | |
| dc.contributor.author | Cheng, Chun-Hu | en_US |
| dc.contributor.author | Chiang, Kuo-Cheng | en_US |
| dc.contributor.author | Pan, Han-Chang | en_US |
| dc.contributor.author | Hsiao, Chien-Nan | en_US |
| dc.contributor.author | Chou, Chang-Pin | en_US |
| dc.contributor.author | Mcalister, Sean P. | en_US |
| dc.contributor.author | Chin, Albert | en_US |
| dc.contributor.department | 機械工程學系 | zh_TW |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | Department of Mechanical Engineering | en_US |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.date.accessioned | 2014-12-08T15:13:09Z | |
| dc.date.available | 2014-12-08T15:13:09Z | |
| dc.date.issued | 2007-11-01 | en_US |
| dc.description.abstract | We have studied the reliability of high-K (K similar to 49) TixHf1-xO (x similar to 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction. | en_US |
| dc.identifier.doi | 10.1143/JJAP.46.7300 | en_US |
| dc.identifier.issn | 0021-4922 | en_US |
| dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.46.7300 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/10148 | |
| dc.identifier.wosnumber | WOS:000251220000025 | |
| dc.language.iso | en_US | en_US |
| dc.subject | reliability | en_US |
| dc.subject | high work function | en_US |
| dc.subject | MIM | en_US |
| dc.subject | TiHfO | en_US |
| dc.subject | Ni | en_US |
| dc.title | Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode | en_US |
| dc.type | Article | en_US |