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DEPOSITION OF TANTALUM NITRIDE THIN-FILMS FROM ETHYLIMIDOTANTALUM COMPLEX

dc.citation.epage98en_US
dc.citation.issue2en_US
dc.citation.spage96en_US
dc.citation.volume11en_US
dc.citation.woscount45
dc.contributor.authorCHIU, HTen_US
dc.contributor.authorCHANG, WPen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.date.accessioned2014-12-08T15:05:01Z
dc.date.available2014-12-08T15:05:01Z
dc.date.issued1992-01-15en_US
dc.identifier.doi10.1007/BF00724610en_US
dc.identifier.issn0261-8028en_US
dc.identifier.journalJOURNAL OF MATERIALS SCIENCE LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1007/BF00724610en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/3553
dc.identifier.wosnumberWOS:A1992HB97600012
dc.language.isoen_USen_US
dc.titleDEPOSITION OF TANTALUM NITRIDE THIN-FILMS FROM ETHYLIMIDOTANTALUM COMPLEXen_US
dc.typeArticleen_US

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