Characterization of the signature of subwavelength variation from far-field irradiance

dc.citation.epage	1047	en_US
dc.citation.issue	10	en_US
dc.citation.spage	1045	en_US
dc.citation.volume	29	en_US
dc.citation.woscount	6
dc.contributor.author	Chu, SC	en_US
dc.contributor.author	Chern, JL	en_US
dc.contributor.department	光電工程學系	zh_TW
dc.contributor.department	Department of Photonics	en_US
dc.date.accessioned	2014-12-08T15:39:10Z
dc.date.available	2014-12-08T15:39:10Z
dc.date.issued	2004-05-15	en_US
dc.description.abstract	The dynamic signature of the subwavelength variation of a slit is shown to be determinable from far-field irradiance with a precision of better than 1 nm. One can increase the efficiency of measurement of the subwavelength's signature by adjusting the detection width over which the subwavelength variation is detected. The subwavelength variation of a rectangular aperture was also examined to show the general feasibility. (C) 2004 Optical Society of America	en_US
dc.identifier.doi	10.1364/OL.29.001045	en_US
dc.identifier.issn	0146-9592	en_US
dc.identifier.journal	OPTICS LETTERS	en_US
dc.identifier.uri	http://dx.doi.org/10.1364/OL.29.001045	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/26771
dc.identifier.wosnumber	WOS:000221189400001
dc.language.iso	en_US	en_US
dc.title	Characterization of the signature of subwavelength variation from far-field irradiance	en_US
dc.type	Article	en_US

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