Induced NH2 bonding of carbon nanotubes using NH3 plasma-enhanced chemical vapor deposition
| dc.citation.epage | 889 | en_US |
| dc.citation.issue | 4 | en_US |
| dc.citation.volume | 23 | en_US |
| dc.citation.woscount | 4 | |
| dc.contributor.author | Chiou, Ai-Huei | en_US |
| dc.contributor.author | Chang, Yu-Ming | en_US |
| dc.contributor.author | Wu, Wen-Fa | en_US |
| dc.contributor.author | Chou, Chang-Ping | en_US |
| dc.contributor.author | Hsu, Chun-Yao | en_US |
| dc.contributor.department | 機械工程學系 | zh_TW |
| dc.contributor.department | Department of Mechanical Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:22:44Z | |
| dc.date.available | 2014-12-08T15:22:44Z | |
| dc.date.issued | 2012-04-01 | en_US |
| dc.description.abstract | Plasma-enhanced chemical vapor deposition was used to modify the multiwall carbon nanotubes (MWCNTs) using ammonia (NH3) plasma. For various durations of NH3 plasma treatment, a scanning electron microscope, X-ray, Raman spectroscopy and contact angle measurement were used to ascertain several characteristics of the MWCNTs. The experimental results show that: (1) the length of the MWCNTs is reduced, if the duration of the plasma treatment is increased; (2) the NH3 plasma treatment can incorporate amine (NH2-) or amino (NH-) functional groups onto the MWCNT surface; (3) the plasma treated carbon nanotubes become more hydrophilic. | en_US |
| dc.identifier.issn | 0957-4522 | en_US |
| dc.identifier.journal | JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/16069 | |
| dc.identifier.wosnumber | WOS:000302817400012 | |
| dc.language.iso | en_US | en_US |
| dc.title | Induced NH2 bonding of carbon nanotubes using NH3 plasma-enhanced chemical vapor deposition | en_US |
| dc.type | Article | en_US |