THICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMS
| dc.citation.epage | 3014 | en_US |
| dc.citation.issue | 22 | en_US |
| dc.citation.spage | 3013 | en_US |
| dc.citation.volume | 66 | en_US |
| dc.citation.woscount | 5 | |
| dc.contributor.author | LIOU, BW | en_US |
| dc.contributor.author | WU, YH | en_US |
| dc.contributor.author | LEE, CL | en_US |
| dc.contributor.author | LEI, TF | en_US |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.date.accessioned | 2014-12-08T15:03:22Z | |
| dc.date.available | 2014-12-08T15:03:22Z | |
| dc.date.issued | 1995-05-29 | en_US |
| dc.identifier.doi | 10.1063/1.114261 | en_US |
| dc.identifier.issn | 0003-6951 | en_US |
| dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1063/1.114261 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/1912 | |
| dc.identifier.wosnumber | WOS:A1995QZ88800030 | |
| dc.language.iso | en_US | en_US |
| dc.title | THICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMS | en_US |
| dc.type | Article | en_US |
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